By Mineo Hiramatsu
Representing the 1st textual content to hide this fascinating new region of study, this ebook will describe synthesis concepts of CNWs, their characterization and numerous anticipated functions utilizing CNWs. Carbon-nanowalls (CNWs) should be defined as two-dimensional graphite nanostructures with edges constructed from stacks of airplane graphene sheets status nearly vertically at the substrate. those sheets shape a wall constitution with a excessive element ratio. The thickness of CNWs levels from a couple of nm to a couple tens of nm. the massive floor sector and sharp edges of CNWs might turn out priceless for a couple of purposes equivalent to electrochemical units, box electron emitters, garage fabrics for hydrogen gasoline, catalyst aid. specifically, vertically status CNWs with a excessive surface-to-volume ratio, function a fantastic fabric for catalyst aid for gasoline cells and in gasoline garage materials.
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Extra resources for Carbon Nanowalls: Synthesis and Emerging Applications
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Shiji K, Hiramatsu M, Enomoto A, Nakamura M, Amano H, Hori M (2005) Vertical growth of carbon nanowalls using rf plasma-enhanced chemical vapor deposition. Diam Relat Mater 14: 831–834 2. Mori T, Hiramatsu M, Yamakawa K, Takeda K, Hori M (2008) Fabrication of carbon nanowalls using electron beam excited plasma-enhanced chemical vapor deposition. Diam Relat Mater 17: 1513–1517 3. Kobayashi K, Tanimura M, Nakai H, Yoshimura A, Yoshimura H, Kojima K, Tachibana M (2007) Nanographite domains in carbon nanowalls.
Hydrocarbon or fluorocarbon gases are excited by a parallel plate capacitively coupled plasma (CCP). The CCP might be useful to produce plenty of hydrocarbon radicals such as CH3 radicals effectively, and also useful for large area deposition of the film. However, owing to the shortage of H atoms, the CCP by itself is not suitable for diamond growth. Therefore, the H atom density around the growing surface is augmented by the injection from high-density H2 plasma as a remote H radical source. For plasma processing using reactive gases, the optimum process performance has been developed by trial and error by changing the external parameters of the processing equipment, such as the frequency of the plasma source, the input power, and the operating pressure.